3D Bio-Printer by 3D Cultures
| 3D Printer Prusa i3 MK3
| Anomaloscope
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CAD
| CCT
| Closed cycle APD cryostat / Furnace multimeters
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Computing for Machine Learning
| CSI NanoObserver AFM
| D33 Meter (Quasi-static) YE2730A
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Detectors, sensors and microcontrollers for prototyping
| Difratometer X’Pert Pró Philips, PanAnalytical
| Display++4
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Dynamic and Electrophoretic Light Scattering Litesizer 500 Anton Paar
| E-Fiber EF100 Starter
| Electromagnet EMU-75
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Electromyography (EMG) system
| FEI NOVA 200 FEG/SEM
| Filmetrics 3D Perfilometer
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Flow cytometer/Beckman Coulter Cytoflex System B4-R2-V0
| Fluoromax 4, Horiba Jobin-Yvon
| FTIR Spectrophotometer (Spectrum Two - PerkinElmer)
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FTIR Spectrum, Perkin Elmer, Spectrum Two FT-IR /SP 10 S/W DTGS
| High-Resolution LSPR spectroscopy
| HPLC-DAD -F (Shimadzu Nexera-i LC-2040C 3D Plus)
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HPLC-MS
| IKA Shaker KS 4000 i
| Infinite M Plex (UV-Vis)
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Ion Chromatograph, 761 Compact IC - Methrom
| Ion-beam sputtering deposition system
| Keithley 2400
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Keithley 6487 Picoammeter/ Voltage Source
| Laser Ablation deposition system
| Laser diffraction granulometry
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Liquid Scintillation Counter, PerKinElmer, Tri-Carb 4810TR
| Multimedia content for science dissemination and communication
| Nd:YAG laser 532/1064nm, 10Hz, mJ pulses
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Nikon (Eclipse T/2) microscope
| Nuclear Magnetic Resonance Instrument 400 MHz Bruker Avance III
| OPA 300nm-2000nm, ~140 fs , uJ pulses
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Plasma treatment - System Zepto by Diener
| Quadtech 190 LCR Meter
| Shimadzu AG-IS
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Spectrofluorometer Fluorolog 3
| Spectrophotometer UV-Vis-NIR Shimadzu UV 3600-Plus
| Spintronics measurements system
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Sputtering depositon system / nanocluster deposition source
| Temperature controlled chamber: Linkam thmse
| Test station for optical devices with laser emission
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Ti:Sapp amplifier 800nm, 1KHz, ~120fs, 2mJ pulses
| Ultrafast Ti:Sapp laser 700-980nm, 76MHz, ~100fs, 10nJ pulses
| UV - Photoeactor
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UV/Vis Spectophotometer T70, PG Instruments
| Vacuum Seebeck
| Vacuum sputtering deposition chamber with Glancing Angle Deposition
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